Lattice Electro Optics(LEO)

製品 – products

製品群
1	Windows, Wedges and Mirror blank	4	Prisms
2	Lenses and Mirror Blanks	5	Laser Mirros
3	CaF2 optics	6	Beam Splitters and Polarizing optics

Windows, Wedges and Mirror blank

Plane Windows (WF)

(仕様)

項目	数値
Diameter Tolerance	+0/-0.005”
Thickness Tolerance	±0.010”
Parallelism	< 3 arc min.
Clear Aperture	> 85% of diameter
Chamfer	0.3mm ´ 45°
Surface Figure	l/10 at 632.8nm
Surface Quality	10-5 scratch-dig

詳細な型番：こちらへ

Wedged Windows (WW)

(仕様)

項目	数値
Diameter Tolerance	+0/-0.005”
Thickness Tolerance	±0.010”
Clear Aperture	> 85% of diameter
Chamfer	0.3mm ´ 45°
Surface Figure	l/10 at 632.8nm
Surface Quality	10-5 scratch-dig

詳細な型番：こちらへ

Lenses and Mirror Blanks

Spherical BK7 Plano-Convex Lenses (B-PX)

(仕様)

項目	数値
Diameter Tolerance:	+0/-0.005”
Thickness Tolerance:	±0.010”
Concentricity:	< 3 arc min.
Clear Aperture:	> 85% of diameter
Focal Length Tolerance	± 0.5%
Surface Figure:	l/10 at 632.8nm
Surface Quality:	10-5 scratch-dig

詳細な型番：こちらへ

Spherical UV Fused Silica Plano-Convex Lenses (UF-PX)

(仕様)

項目	数値
Diameter Tolerance:	+0/-0.005”
Thickness Tolerance:	±0.010”
Concentricity:	< 3 arc min.
Clear Aperture:	> 85% of diameter
Focal Length Tolerance	± 0.5%
Surface Figure:	l/10 at 632.8nm
Surface Quality:	10-5 scratch-dig

詳細な型番：こちらへ

CaF2 optics

CaF2 Plano-Convex Lenses

(仕様)

項目	数値
Diameter Tolerance:	+0/-0.005”
Thickness Tolerance:	±0.010”
Concentricity:	< 3 arc min.
Clear Aperture:	> 85% of diameter
Focal Length Tolerance	± 2%
Surface Figure:	l/2 at 632.8nm
Surface Quality:	40-20 scratch-dig

詳細な型番：こちらへ

Prisms

Precision Right Angle Prisms(RP)

項目	数値
Dimensional Tolerance:	+0/-0.010”
Angular Tolerance:	< 3 arc min.
Clear Aperture:	> 80% of central dimension
Chamfer:	0.3mm ´ 45°

詳細な型番：こちらへ

Precision Bending & Folding Prisms (BRP, FRP)

項目	数値
Dimensional Tolerance:	+0/-0.010”
Angular Tolerance:	< 3 arc min.
Clear Aperture:	> 80% of central dimension
Chamfer:	0.3mm ´ 45°

詳細な型番：こちらへ

Laser Mirros

Excimer Laser Cavity Optics

(仕様)

項目	数値
Material:	VUV CaF2
Parallelism:	< 3 arc min.
Clear Aperture:	> 80% of central dimension
Chamfer:	0.3mm ´ 45°
Surface Figure:	l/10 at 632.8nm
Surface Quality:	20-10 scratch-dig
Power:	Up to 1-4 J/cm2

Excimer Laser Mirrors ArF (193nm) & KrF (248nm)

(仕様)

項目	数値
Material:	VUV CaF2, UV Fused Silica
Parallelism:	< 3 arc min
Clear Aperture:	> 85% of central dimension
Chamfer:	0.3mm ´ 45°
Surface Figure:	l/10 at 632.8nm
Surface Quality:	20-10 for VUV CaF2
	10-5 for UV Fused Silica
Power:	Up to 1J/cm2, ArF
	Up to 4J/cm2, KrF

詳細な型番：こちらへ

Beam Splitters and Polarizing optics

High Energy Beamsplitters (BS)

(仕様)

項目	数値
Material:	BK7 or Fused Silica
Parallelism:	< 3 arc min
Clear Aperture:	> 85% of central dimension
Chamfer:	0.3mm ´ 45°
Surface Figure:	l/10 at 632.8nm
Surface Quality:	10-5 scratch-dig
Power:	Up to 10-20 J/cm2
	for 10 nsec pulse typical   @1064nm

詳細な型番：こちらへ

Wide Band Beamsplitters (WBS)

(仕様)

項目	数値
Material:	BK7
Parallelism:	< 3 arc min
Clear Aperture:	> 85% of central dimension
Chamfer:	0.3mm ´ 45°
Surface Figure:	l/10 at 632.8nm
Surface Quality:	10-5 scratch-dig

詳細な型番：こちらへ